Self-Assembled Two-Dimensional Block Copolymers on Pre-patterned Templates with Laser Interference Lithography

摘要

We present an experimental result of the self-assembling for cylindrical nanostructures of PS-b-PMMA block copolymers (BCPs) on pre-patterned templates. The templates are fabricated by two-beam interference lithography at 325nm into negative SU-8 photoresist. To align the BCPs nanostructures perpendicular the surface of templates, homopolymer polystyrene (hPS) layer is brushed on the patterns for modifying the interfacial energies. Thus, precisely control the localization and orientation of PS-b-PMMA nanostructures on patterned substrates is achieved.