Effect of O_2 Partial Pressure on Magnetic Properties of Alloys CoFe-rich Nanocrystalline Thin Films

摘要

Alloys of CoFe-rich magnetic films are well known as typical soft magnetic alloys. They are used for many kinds of electric and electronic parts such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of the CoFe-based nanocrystalline thin films, the effect of O_2 partial pressure on magnetic properties of Co-Fe-Hf-O nanocrystalline thin films have been investigated. It is found that the soft magnetic properties and electrical property of these films show a dependence on the partial pressure of reactive gases, which presumably changes the microstructure of the films and related magnetic anisotropy. With optimal conditions, thin film exhibit excellent soft magnetic properties: saturation magnetization (4πM_s) of 21 kG, magnetic coercivity (H_c) of 0.18 Oe, anisotropy field (H_k) of 49 Oe, and an electrical property is also shown to be as high as 300 μΩcm. The combination of high 4πM_s and relatively high H_k in these films are believed to be partly responsible for the excellent ultra-high-frequency behavior.