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Influence of atomic hydrogen on intrinsic defects in CuInSe2

机译:原子氢对Cuinse2中固有缺陷的影响

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Hydrogen with an energy of 300 eV was implanted into single crystalline CuInSe2 samples at temperatures of 200 °C and 300 °C during implantation.We found that the hydrogen is not limited to the expected implantation depth but diffuses into the bulk of the sample.The hydrogen concentration ranges from 101 H/cm in a depth of about 300 nm up to some 1021 H/cm3 next to the surface and resembles a diffusion profile.The hydrogen induced change of composition was not only at the surface,but also up to a depth of about 200 nm similar to that of the hydrogen profile.Mainly a Cu deficiency after hydrogen implantation could be observed and is explained as the passivation of V_(Cu) by hydrogen and the additional production of V_(Cu) by the induced band-bending.
机译:在植入过程中,在200℃和300℃的温度下植入具有300eV的能量的氢气在200℃和300℃的温度中。我们发现氢不限于预期的植入深度,但扩散到样品的大部分中。氢浓度范围为101h / cm,深度为约300nm至表面旁边的约1021h / cm3,并类似于扩散曲线。氢诱导的组合物变化不仅在表面,还在表面上与氢剖面的深度约为200nm.可以观察到氢气植入后的Cu缺乏,并被氢气通过氢气和诱导的带的递增的v_(cu)的递增产生的钝化和诱导的频段弯曲。

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