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Effects of Surface Termination on CuIn_(1-x)Ga_xSe2 Prepared from Mixed Cu-In-Ga-Se Precursors

机译:表面终止对混合Cu-in-Se前体制备的Cuin_(1-X)Ga_sse2的影响

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Thin film CuIn(Ga)Se2 samples were prepared by a two-stage method starting from amorphous or nano-crystalline precursor structures.Deposition of individual Cu+Se and In+Se layers as a function of substrate temperature revealed the onset of detectable crystal structures at T_(sub) = 100°Cand T_(sub) > 200°C,respectively.For the quaternary system the formation of CuInSe2 was observed at 400°C and evidence was found for liquid CuxSe assisted growth.Further focus was on surface termination schemes with the objective to enhance the open-circuit voltage.Ga+Se,In+Se,Ga+Se/In+Se,and In+Se/Ga+Se terminating layers with varying amounts of Ga and In are addressed.Schemes studied to date have resulted in an increase in V_(oc) at the expense of short-circuit current.The use of Ga containing termination layers resulted in the formation of large voids in the CIGS which could be explained by the volume changes during formation of the quaternary material and a Cu2Se free surface in these instances.
机译:通过从无定形或纳米结晶前体结构开始的两级方法制备薄膜Cuin(Ga)Se2样品。作为衬底温度的函数,单独的Cu + Se和In + Se层的分子呈现出可检测的晶体结构的发作在T_(Sub)= 100°CAND T_(Sub)> 200°C时。对于季度系统,在400℃下观察到CuinSe2的形成,发现液体核心辅助生长的证据。焦点关注表面终止目的是提高开路电压的方案.Ga + Se,In + Se,Ga + Se / In + Se,以及具有不同量的Ga和In的+ SE / Ga + Se终止层。研究了研究迄今为止已经导致v_(oc)增加,以牺牲短路电流为代价。使用Ga的终止层导致CIGS中的大空隙形成,这可以通过在形成期间的体积变化来解释在这些情况下,第四次材料和Cu2se自由表面。

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