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Observation of Intel-diffusion in ZnO/CuInSe2 Heterostructures and its Effect on Film Properties

机译:观察ZnO / Cuinse2异质结构中的英特尔扩散及其对膜性能的影响

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ZnO films were grown directly on epitaxial CuInSe2 (001) (CIS) by radical-source molecular beam epitaxy (RS-MBE).The substrate-film interdiffusion was investigated dependent on the ZnO growth temperature.Secondary Ion Mass Spectroscopy (SIMS) profiles indicate the mutual temperature-activated diffusion of Zn and In at a growth temperature of 440°C which is absent at 250°C.Zn indiffusion into the CIS substrate leads to characteristic changes in the photolumi-nescence (PL) properties,whereas the In outdiffusion into the growing ZnO film causes an increased carrier concentration.
机译:通过自由基源分子束外延(RS-MBE)直接在外延CuinSe2(001)(CIS)上直接生长ZnO膜。研究基质膜相互作用,取决于ZnO生长温度。渗透性离子质谱(SIMS)轮廓表示Zn的互温活化扩散和在440℃的生长温度下,在250℃的440℃下不存在于CIS底物中,导致光致(PL)性质的特征变化,而在较阳下进入生长的ZnO膜导致载体浓度增加。

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