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Electronic properties of chemically etched CdTe thin films: role of Te for back-contact formation

机译:化学蚀刻CDTE薄膜的电子性质:TE对后接触形成的作用

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Improvement of electric hack contact formation is one of the major issues of the CdTe thin film solar cell research. Chemical etching of CdTe before metallization is accepted to improve contact formation. It is believed that a CdTe/Te contact is formed by this procedure leading to a Fermi level position in the CdTe close to the valence band maximum for low contact resistance. We have studied the electronic properties of chemically etched CdTe surfaces with photoelectron spectroscopy. Etching of the samples was performed in air ("ex-situ") as well as in an electrochemical setup directly attached to the UHV system ("in-situ"). The formation of a Te layer is clearly shown by (S)XPS In contrast to previous studies we could not detect the formation of a p-CdTe surface for different experimental conditions. The detected Fermi level position indicates still band bending and hence a blocking Schottky barrier.
机译:改善电动黑客触点形成是CDTE薄膜太阳能电池研究的主要问题之一。接受金属化前CDTE的化学蚀刻以改善接触形成。据信,通过该过程形成CDTE / TE接触,导致CDTE中的FERMI水平位置接近靠近触点电阻的价带最大值。我们研究了使用光电子谱的化学蚀刻CDTE表面的电子特性。在空气中进行样品的蚀刻(“ex-situ”)以及直接连接到UHV系统的电化学设置(“原位”)中。与先前的研究相比,(S)XPS清楚地显示了TE层的形成,我们无法检测到不同实验条件的P-CDTE表面的形成。检测到的费米水平位置表示静止带弯曲,因此是一个阻挡肖特基障碍。

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