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Potential-Controlled Crossover from Step Flow to 3D Step Decoration:Ni Electrodeposition on Ag(lll)

机译:从步骤流到3D步装饰的潜在控制的交叉:AG(LLL)上的Ni电沉积

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A novel growth effect,the potential-controlled transition from 2D step-flow growth (-0.69 V_(Ag/AgCl)) to (i) selective growth of 3D admetal islands at substrate steps (-0.73 V) and (ii) 3D island growth on steps and substrate terraces (-0.85 V),is demonstrated for Ni electro-deposition on Ag(111).The nucleation and growth process apparently proceeds via direct deposition from the solution at step sites and can be rationalized by a kinetically controlled multiplayer growth process,where the higher layer nucleation rate increases more with over-potential than does the 2D growth rate.This effect affords new possibilities for the controlled nanostructuring of metal electrodes.
机译:一种新的生长效果,从2D步骤流动生长(-0.69V_(Ag / AgCl))至(i)在底物步骤(-0.73V)和(II)3D岛上选择性生长3D甲壳岛的选择性生长在Ag(111)上对Ni电沉积进行了步骤和衬底梯度(-0.85V)的生长。核心和生长过程明显通过在步部位的溶液中直接沉积,并且可以通过动力学控制的多人来合理化生长过程,其中较高层的成核速率随着2D增长率的过势而增加。该效果提供了金属电极的受控纳米结构的新可能性。

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