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Rapid thermal low pressure chemical vapor deposition of tin layers from the TiCI/sub 4/-NH/sub 3/-H/sub 2/ gaseous phase

机译：从TiCi / Sub 4 / -NH / Sub 3 / -H / Sub 2 /气相中的锡层的快速热低压化学气相沉积

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《European Workshop on Materials for Advanced Metallization》|1998年||共2页
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Bouteville A.; Imhoff L.; Institute of Electric and Electronic Engineer;
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中图分类自动化技术、计算机技术;
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4. Rapid thermal low pressure chemical vapor deposition of tin layers from the TiCI/sub 4/-NH/sub 3/-H/sub 2/ gaseous phase [C] . Bouteville, A., Imhoff, . 1998

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