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Effect of Film Thickness on the Fracture Toughness of Amorphous Diamond-like Carbon

机译:膜厚度对无定形金刚石状碳裂缝韧性的影响

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Fracture toughness, K_(IC), measurements were conducted for the first time on hydrogen-free tetrahedral amorphous Diamond-like Carbon (ta-C) MEMS-scale specimens of different thicknesses. Uniform gage microscale specimens with mathematically sharp edge pre-cracks were prepared by microindentation on the SiO_2 sacrificial layer. The radial-median crack from the indent propagated into the specimen generating a sharp pre-crack. The crack length was measured by an Atomic Force Microscope (AFM). Freestanding fracture specimens were then obtained by wet etching the SiO_2 sacrificial layer. Microtensile tests were performed on the pre-cracked specimens under mode-Ⅰ loading in fixed grip configuration. In order to investigate the specimen thickness dependence of K_(IC), fracture tests were conducted on specimens with thicknesses in the range of 0.5-3 μm. K_(IC) was 4.25 ± 0.7 MPam~(1/2) for 0.5 μm specimens, 4.4±0.4 MPam~(1/2) for 1 μm specimens, and 3.06±0.17 MPam~(1/2) for 3 μm thick specimens. The 25% lower fracture toughness of the 3 μm films points to a film thickness dependence of fracture toughness that was attributed to different through-the-thickness stresses in considerably thick ta-C films and compositional changes occurring during post-deposition processing.
机译:裂缝韧性K_(IC),首次对不同厚度的无氢无定形金刚石样碳(TA-C)MEMS级标本进行测量。通过在SiO_2牺牲层上进行微观凸缘制备具有数学锋利的边缘预裂缝的均匀量大学标本。从缩进的径向中间裂缝传播到产生尖锐的预裂纹的样本中。裂缝长度由原子力显微镜(AFM)测量。然后通过湿法蚀刻SiO_2牺牲层获得独立的骨折样本。在固定抓握构型中,对模式-Ⅰ负载下的预裂纹试样进行显微调制试验。为了研究K_(IC)的标本厚度依赖性,在厚度的标本上进行裂缝试验,厚度为0.5-3μm。 K_(IC)为4.25±0.7mPAM〜(1/2),为0.5μm样品,4.4±0.4mPam〜(1/2),为1μm样品,3.06±0.17 mpam〜(1/2)厚3微米标本。 3μm膜的25%较低的断裂韧性指向骨折韧性的薄膜厚度依赖性,其归因于在沉积后处理期间发生的相当厚的TA-C薄膜和成分变化的不同厚度应力。

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