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40 V to 100 V NLDMOS built on thin BOX SOI with high energy capability, state of the art Rdson/BVdss and robust performance

机译:40 V至100 V NLDMOS构建在薄盒SOI上,具有高能量能力,最先进的RDSON / BVDS和强大的性能

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摘要

We report in this paper for the first time that power LDMOS transistors integrated in thin BOX SOI can achieve high energy capabilities comparable to bulk BCD technologies and almost identical breakdown voltages for both high and low side applications. With proper top silicon thickness consideration, NLDMOS transistors for a voltage range from 40V to 100V with state of the art Rdson/BVdss trade-off and robust device performance are successfully constructed via a simple design concept.
机译:我们在本文中报告了第一次集成在薄盒SOI中的电源LDMOS晶体管可以实现与批量BCD技术相当的高能量能力,以及高侧应用的几乎相同的击穿电压。具有适当的顶部硅厚度考虑,通过简单的设计概念成功构建了与现有技术的电压范围为40V至100V的电压范围的NLDMOS晶体管。

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