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Design and Test of a Rapid Thermal Annealing Furnace for Improving Surface Properties of Silicon Brick in Multi-Wire Sawing Process

机译:快速热退火炉的设计与试验,用于改善多线锯切工艺中硅砖的表面特性

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Multi-wire sawing process with free abrasive slurry or called multi-wire slurry wire sawing (MW-SWS) process has been popularly adopted in slicing of silicon substrates for solar cell application. However, the chipping or edge cracking of thin thickness as 200 μm of such silicon substrates need to be improved in current mass production. The potential subsurface cracks induced by previous edge grinding or brush polishing of silicon brick may be the main cause. This paper is to develop a rapid thermal annealing (RTA) process for thermal annealing of the surface quality of silicon brick before MR-SWS. In this study, a RTA furnace is designed and used to improve the material property of surface of silicon brick. A quartz crucible is used as heating source with the maximum heated specimen size of 156×156×100 mm (W×H×L). The bulk silicon brick used in this study is selected with a size of 20×10×20 mm (W×H×L) and supplied by the Sino-American Silicon Ltd. (SAS) in Hsinchu, Taiwan. The nitrogen gas is also injected as a protective gas for target heating temperature around 550°C with rapid heating rate of 50°C per second. The micro-Vickers (Akashi MVK-H1) and SEM (JSM-6500F, JOEL) instruments have been used to observe the improvement of rectified material properties of bulk silicon substrate. Experiments of silicon wafers have been first performed for obtaining the recipe of RTA testing and then adjusting for silicon brick testing. Results have been verified by the lower surface hardness and larger crystal grain size after RTA treatment. Furthermore, such treated silicon brick can be further adopted for MW-SWS process to identify the effects of reducing chipping or edge cracking of silicon substrates for solar cell application.
机译:具有自由磨料浆料的多线锯工艺或称为多线浆线锯(MW-SWS)工艺的硅基衬底普遍采用太阳能电池应用。然而,在当前批量生产中需要提高薄厚度薄厚度的薄厚度或边缘破裂。先前的边缘研磨或硅砖抛光引起的潜在地下裂缝可能是主要原因。本文在于MR-SWS之前开发出快速的热退火(RTA)方法,用于热退火硅砖的表面质量。在这项研究中,设计并用于改善硅砖表面的材料特性。石英坩埚用作加热源,最大加热样品尺寸为156×156×100mm(W×H×L)。本研究中使用的散装硅砖的尺寸为20×10×20mm(w×h×l),并由SINA Amerian Silicon Ltd.(SAS)提供在台湾。氮气也被注射为靶加热温度的保护气体,以每秒50°C的快速加热速率约为550℃。微维克斯(Akashi MVK-H1)和SEM(JSM-6500F,JOEL)仪器已用于观察散装硅衬底的整流材料特性的改善。首先进行了硅晶片的实验,以获得RTA测试的配方,然后进行调整硅砖测试。通过RTA处理后的较低表面硬度和较大的晶粒尺寸验证了结果。此外,可以进一步采用这种经处理的硅砖用于MW-SWS工艺,以识别减少硅基衬底用于太阳能电池应用的碎裂或边缘开裂的效果。

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