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Effect of indium doping on microstructural, optical and fluorescence properties of ZnO thin films

机译:铟掺杂对ZnO薄膜微观结构,光学和荧光性能的影响

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The Undoped and 1-5 at.% In doped ZnO thin films were deposited on glass substrates by chemical spray pyrolysis technique. The samples were subjected to investigation for variation of their structural, morphological, optical transmittance and fluorescence properties with Indium doping concentration. The most intense three characteristic diffraction peaks <100>, <002> and <101> for zincite phase reveals the formation of polycrystalline nanoparticulate ZnO thin films. The increase of <002> peak intensity with Indium doping shows a tendency towards c-axis orientation of the ZnO crystallites. The crystal reorientation may be attributed to the oxygen deficiency in ZnO lattice. This also leads to decrease in crystallite size as well as nanoparticle size. The photoemission peaks at 450 nm and 480 nm has been attributed to intrinsic defect states like O_i, Zn_i and V_(Zn), whereas the peak at 467 nm has been linked to defects caused by lattice deformations upon In doping.
机译:通过化学喷雾热解技术沉积在掺杂ZnO薄膜中的未掺杂和1-5。 对样品进行调查,以调查它们具有铟掺杂浓度的结构,形态,光学透射率和荧光性质的变化。 最强烈的三个特征衍射峰<100>用于锌岩相的衍射峰<100> <002>和<101>揭示了多晶纳米颗粒ZnO薄膜的形成。 铟掺杂的<002>峰强度的增加显示了ZnO微晶的C轴取向的趋势。 晶体重新定向可能归因于ZnO格子中的缺氧。 这也导致微晶尺寸和纳米颗粒尺寸的降低。 450nm和480nm处的光曝光峰被归因于o_i,zn_i和v_(zn)等内在缺陷状态,而467nm处的峰值已与掺杂时的晶格变形引起的缺陷连接。

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