The efficiency of the rinse process in automated wet cleaning stations is examined following HF-last cleans. Experimental results are presented showing the effects of tank geometry, flow parameters, cassette geometry, cassette materials, and wafer load. A theoretical model for the fluid dynamics in a rinse tank is developed which yields information regarding the flow distributions between and around wafers in a cassette. The time dependence of the tank resistivity during the rinse process is fitted to a second order mathematical model based on convective transport and ideal mixing assumptions. The effectiveness of the model confirms the importance of the fluid dynamics in the rinse process.
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