Effect of chemical etching on the surface roughness of CdZnTe and CdMnTe gamma radiation detectors

摘要

Generally, mechanical polishing is performed to diminish the cutting damage followed by chemical etching to remove the remaining damage on crystal surfaces. In this paper, we detail the findings from our study of the effects of various chemical treatments on the roughness of crystal surfaces. We prepared several CdZnTe (CZT) and CdMnTe ( CMT) crystals by mechanical polishing with 5 gm and/or lower grits of Al_2O_3 abrasive papers including final polishing with 0.05-μm particle size alumina powder and then etched them for different periods with a 2%, 5% Bromine-Methanol (B-M) solution, and also with an E-solution (HNO_3:H_2O:K_2Cr_2O7). The material removal rate (etching rate) from the crystals was found to be 10 pm, 30 μm, and 15 μm per minute, respectively. The roughness of the resulting surfaces was determined by the Atomic Force Microscopy (AFM) to identify the most efficient surface processing method by combining mechanical and chemical polishing.