Study on control strategy for coarse/fine dual-stage of step and scan lithography

摘要

Lithography is one of the most important and complicated key equipments for the Integrated Circuit (IC) manufacture. The ultra-precision stage is the important subsystem of lithography and its motion performance impacts directly on the resolution and throughput of lithography. In this paper, a robust and high response speed control strategy for dual-stage manipulator is presented. The coarse/fine dual-stage uses the linear motor driven coarse (macro) positioning stage and the Lorenz plane motor driven fine (micro) positioning stage. By adopting merits of both coarse and fine actuator, a desirable system having the capacity of large workspace with high resolution of motion is enabled. The feedback controller is constructed so that the fine stage tracks the coarse stage errors. The controller is robustly designed as the master-slave control strategy. In addition, the position decoupling which translates fine stage's machine position command into its actual position command are discussed and, as a result, the overall coarse/fine dual-stage servo system exhibits robust and high response speed performance. Simulation shows that master-slave controller can much decrease positioning error and improve response speed of the coarse/fine dual-stage system.? (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.