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Microstructure and Dielectric Properties of Heat-treated SiC-AlN Multiphase Ceramics

机译:热处理SiC-AlN多相陶瓷的组织和介电性能

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Silicon carbide is widely used as an important structural material. It is known for its extreme hardness, high temperature antioxygenic properties and good tribological properties. Moreover, SiC is also an intrinsic semiconductor. SiC can react with A1N and form an extensive solid solution at temperatures between 1800 to 2100 deg C, and has excellent mechanical properties. However, in this article, we study the influence of the microstructure and the dielectric properties of SiC ceramics. SiC-AIN solid-solution ceramics were prepared by hot-pressed sintering using Y_2O_3 as the sintering additive. The size of SiC and AlN powders were 0.6 mu m and 1.06pm respectively. The content of A1N starting powders was 14vol percent. The hot-processing sintered SiC-AIN multiphase ceramics have reached high density at 1950 deg C in Ar atmosphere under 30MPa.The hot-processed ceramics were subjected to thermal treatments in a range of temperatures between 1100 deg C and 1600 C for 3hr. The grain size increased with the annealing temperature. X-ray diffraction profiles show that phase relationships. Scanning electron microscopy (SEM)) was used to determine fracture surface and the local compositions. Dielectric permittivities and dissipation factor of SiC-AIN composites were investigated with the varieties of annealing temperature and the content of A1N particles. Dielectric constants (epsilon) and Dielectric loss tangents (tan8) were measured within the microwave frequency range from 40Hz to 10MHz.
机译:碳化硅广泛用作重要的结构材料。它以其极端硬度,高温抗氧化性能和良好的摩擦学特性所知。此外,SiC也是内在半导体。 SiC可以与A1N反应并在1800至2100℃的温度下形成广泛的固溶体,具有优异的机械性能。然而,在本文中,我们研究了SiC陶瓷的微观结构和介电性能的影响。通过使用Y_2O_3作为烧结添加剂,通过热压烧结制备SiC-AIN固溶陶瓷。 SiC和AlN粉末的尺寸分别为0.6μm和1.06秒。 A1N起始粉末的含量为14Vol%。在30MPa下,热处理烧结SiC-AIN多相陶瓷在1950℃下达到高密度。在30MPa下,在1100℃和1600℃的温度范围内进行热处理陶瓷在热处理3小时。晶粒尺寸随退火温度而增加。 X射线衍射轮廓显示相位关系。扫描电子显微镜(SEM)用于确定骨折表面和局部组合物。利用退火温度和A1N颗粒的含量研究了SiC-AIN复合材料的介电介电活性和耗散因子。在微波频率范围内从40Hz至10MHz的微波频率范围内测量介电常数(epsilon)和介电损耗切线(TAN8)。

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