DEPOSITION OF COATINGS BY A JET RF-PLASMA OF LOW PRESSURE

机译：通过低压的喷射射频沉积涂层

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摘要

Were investigated basic electrophysical and mechanical characteristics of a dielectric and metal films.

机译：研究了电介质和金属膜的基本电神法和机械特性。

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《the European Conference on Thermal Plasma Processes》|2003年||共7页
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GALIAOUTDINOV R.T.; KASHAPOV N.F.;
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中图分类工程材料学;
关键词
nonequilibrium low-temperature plasma; films;

机译：不合格低温等离子体;薄膜;

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机译：通过低压的喷射射频沉积涂层
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DEPOSITION OF COATINGS BY A JET RF-PLASMA OF LOW PRESSURE

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