Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate

摘要

Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100), SrTiO_3(100), and LaAlO_3(100), by low pressure metalorganic chemical vapor deposition (MOCVD) using cobalt(II) acetylacetonate as the precursor. Films obtained in the temperature range 400-600°C were uniform and highly crystalline having Co_3O_4 phase as revealed by x-ray diffraction. Under similar conditions of growth, highly oriented thin films of cobalt oxide grow on SrTiO_3(100) and LaAlO_3(100). The microstructure and the surface morphology of cobalt oxide films on glass, Si(100) and single crystalline substrates, SrTiO_3(100) and LaAlO_3(100) were studied by scanning electron microscopy. Optical properties of the films were studied by uv-visible-near IR spectrophotometry.