ferroelectric diodes; pulsed laser deposition; buffer layer; Bi_4Ti_3O_(12); Pb(Zr_(0.52)Ti_(0.48))O_3;
机译:改善溅射PB_(1.10)的电性能(Zr_(0.52),Ti_(0.48))O_3 / PB_(1.25)(Zr_(0.52),Ti_(0.48))O_3多层薄膜
机译:双面(Pb_(0.72)La_(0.28))Ti_(0.93)O_3缓冲层对Pb(Zr_(0.52)Ti_(0.48))O_3薄膜铁电性能的影响
机译:热等静压结晶Pb(Zr_(0.52)Ti_(0.48))O_3薄膜的铁电性能和记忆特性
机译:AU / PB的性质(Zr_(0.52)Ti_(0.48))O_3 / Bi_4Ti_3O_(12)/ P-Si铁电存储二极管
机译:Pb(Zr0.52Ti0.48)O3铁电纳米晶体的原位极化和介电性能测量
机译:柔性,温度稳定,疲劳可耐久的PBZR 0.52 TI 0.48 O 3铁粘物记忆的铁电薄膜