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Properties of Au/Pb(Zr_(0.52)Ti_(0.48))O_3/ Bi_4Ti_3O_(12)/p-Si Ferroelectric Memory Diodes

机译:AU / PB的性质(Zr_(0.52)Ti_(0.48))O_3 / Bi_4Ti_3O_(12)/ P-Si铁电存储二极管

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A ferroelectric memory diodes that consists of Au/Pb(Zr_(0.52)Ti_(0.48)O_3/Bi_4/Ti_3O_(12)/p-Si multilayer configuration was fabricated by pulsed laser deposition (PLD) technique. The ferroelectric properties and the electrical characteristics of the ferroelectric film system were investigated. The polarization-voltage curve of Pb(Zr_(0.52)Ti_(0.48)O_3/Bi_4Ti_3O_(12) thin films system had an asymmetry hysteresis loop with P_T=20μC/cm~2 and E_C=48 kV/cm, and the decay in remnant polarization was only 10% after 10~9 switching cycles. The C-V curve and the I-V curve showed memory effects derived from the ferroelectric polarization of PZT/BIT films. The current density was 6.7X10~(-8) A/cm~2 at a voltage of +4V, and the conductivity behavior is discussed. The results suggested that the growth of the BIT ferroelectric layer is helpful to good ferroelectric properties, fatigue and capacitance retention characteristics.
机译:由Au / Pb(Zr_(0.52)Ti_(0.48)O_3 / Bi_4 / Ti_3O_(12)/ P-Si多层配置由脉冲激光沉积(PLD)技术制造的铁电存储二极管。铁电特性和电气研究了铁电薄膜系统的特性。PB的偏振电压曲线(Zr_(0.52)Ti_(0.48)O_3 / Bi_4Ti_3O_(12)薄膜系统具有不对称的滞后环,具有P_T =20μC/ cm〜2和e_c =在10〜9个切换周期后,残余极化中的衰减衰减仅为10%。CV曲线和IV曲线显示出从PZT /比特膜的铁电偏振衍生的记忆效应。电流密度为6.7x10〜 (-8)在+ 4V的电压下的A / cm〜2,并讨论导电行为。结果表明,比特铁电层的生长有助于良好的铁电性能,疲劳和电容保持特性。

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