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Zinctelluride as an alternative back contact for CdTe/CdS solar cells

机译:ZinctellUride作为CDTE / CDS太阳能电池的替代背部接触

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Electrodeposition is chosen for preparation of the back contact for CdS/CdTe thin film solar cells because it is one of the most inexpensive ways to form semiconductors. Additionally, it offers the possibility for in-situ doping by adding very few amounts of the dopant into the deposition bath. Common CdTe solar cells have the following superstrate configuration: TCO/CdS/CdTe/metal. The CdTe/metal back contact leads to losses of the fill-factor and the efficiency due to the formation of Schottky contact. This is caused by a high work function of CdTe and the difficulty to get p{sup}(++)-CdTe. In order to create an ohmic contact, a thin layer of ZnTe is formed electrochemically. Low long term stability is caused by diffusion of metal atoms from the back contact. Both problems shall be solved by deposition of an intermediate layer between CdTe and the metal back contact. ZnTe is supposed to lower the barrier height and act as a diffusion barrier leading to a decreased degradation of the cell. The deposition parameters pH-value, temperature, bath-composition and the deposition potential are varied. In order to find the correct parameters ZnTe is deposited on ITO-substrates first. These ZnTe layers are characterized by transmission spectra, energy dispersive x-ray spectroscopy (EDX), scanning electron microscopy (SEM) and x-ray diffraction (XRD). On CdTe substrates the deposition potential is altered slightly. Uniform ZnTe layers are obtained, if the CdTe surface is etched with lithium hydroxide solution. After electrodeposition of ZnTe the cells are completed with Ni and Au by physical vapour deposition. Cells are investigated by means of I-U measurements and compared to those without intermediate ZnTe-layer.
机译:选择电沉积用于制备CDS / CDTE薄膜太阳能电池的背触点,因为它是形成半导体的最便宜的方式之一。此外,它还提供了通过在沉积浴中添加非常少量的掺杂剂来原位掺杂的可能性。常见的CDTE太阳能电池具有以下超级晶体配置:TCO / CDS / CDTE /金属。 CDTE /金属背面接触导致填充因子的损耗和由于肖特基接触的形成导致的效率。这是由CDTE的高功函数和难以获取p {sup}(++) - cdte引起的。为了产生欧姆接触,电化学形成薄层ZnTe。低长期稳定性是由金属原子扩散从后接触引起的。两个问题应通过沉积CDTE和金属背部接触之间的中间层来解决。 ZnTe应该降低阻挡高度,并充当扩散屏障,导致细胞降低降低。沉积参数pH值,温度,浴 - 组合物和沉积电位改变。为了找到正确的参数首先在ITO - 基板上沉积Znte。这些ZnTe层的特征在于透射光谱,能量分散X射线光谱(EDX),扫描电子显微镜(SEM)和X射线衍射(XRD)。在CDTE基板上,沉积电位略微改变。获得均匀的ZnTe层,如果用氢氧化锂溶液蚀刻CdTe表面。在ZnTe电沉积后,通过物理气相沉积用Ni和Au完成细胞。通过I-U测量研究细胞,并与没有中间ZnTe层的那些进行比较。

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