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Quantum dot intermixing with thermal and laser annealing

机译:用热和激光退火混合量子点混合

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Photoluminescence (PL) was used to investigate the interdiffusion of self-assembled InAs/GaAs quantum dots (QDs) treated by rapid thermal annealing (RTA) and laser annealing. The observation of intense and sharp shell structures confirmed that the QDs retained their zero-dimensional density of states. In addition, three main effects of alloy intermixing were demonstrated in QDs having different intersublevel spacings. The emission has been strongly blue-shifted, up to approx 200 meV for RTA samples and approx 298 meV for the laser annealed ones. The intersublevel spacing was tuned between approx 60 meV to approx 25 meV in the RTA case, but down to approx 12 meV in the case of laser-induced intermixing. Finally the inhomogeneous broadening linearly decreased from a FWHM of approx 46 meV down to smaller than 15 meV for RTA and 8 meV in the most extreme case of laser annealing. For samples annealed at the highest temperatures, the most energetic shells of QDs become unbound. Across varying samples, the result of the intermixing was to increase the uniformity of their PL spectra. A one-dimensional model of Fickian diffusion for the growth direction was used to model their PL emission. Rapid thermal annealing and laser annealing provide two additional ways of manipulating the energy levels of self-assembled QD ensembles by tuning the intersublevel energy-spacing and the number of confined states.
机译:光致发光(PL)用于研究通过快速热退火(RTA)和激光退火处理的自组装inas / gaas量子点(qds)的相互扩散。观察强度和锐壳结构证实QDS保留了它们的零尺寸密度。此外,在具有不同交叉间距的QD中证实了合金混合的三种主要效果。发射强烈蓝移,高达约200meV的RTA样品,激光退火的样品和大约298mev。在RTA壳体中,间隙间距在大约60meV至约25meV之间调谐,但在激光引起的混合的情况下降至约12meV。最后,在激光退火最极端的情况下,在大约46meV下降到小于15meV的FWHM,从大约46meV下降到小于15mev的敞口宽度下降。对于在最高温度下退火的样品,QD的最精力充沛的壳体成为未缔结的。在不同的样品中,混合的结果是增加其PL光谱的均匀性。用于增长方向的Fickian扩散的一维模型用于模拟它们的PL发射。快速热退火和激光退火提供了两种通过调整交叉能量 - 间隔和限制状态的数量来操纵自组装QD系列的能量水平的额外方法。

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