MULTISCALE GRAPHENE TOPOGRAPHIES PROGRAMMED BY SEQUENTIAL MECHANICAL DEFORMATION (I wish to compete for either the Mrozowski Award (if oral) or Walker Award (if poster))

摘要

Complex surface topographies emerge in ultrathin-layered materials undergoing large mechanical deformations.[1] For thin elastic sheets, out-of-plane bending is energetically favored over in-plane compression, resulting in regular periodic wrinkles[2, 3] or disordered crumples.[4] This approach has been previously explored to pattern simple interfacial structures with a characteristic feature size and orientational (dis)order. However, the ability to independently engineer feature size and orientational order across multiple length scales remains a challenge. An intriguing prospect is to use sequential mechanical deformation in various combinations to create hierarchical surface patterns, which could be fabricated over large areas without specialized equipment. These patterns may be realized using thin films of two-dimensional (2D) nanomaterials such as graphene,[5] which display exceptional chemical and physical properties for technological applications, such as stretchable electronics, energy storage, and controlled wetting.