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Variation Tolerant 9T SRAM Cell Design

机译:变异耐受9T SRAM CELL设计

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Nanoscale SRAM memory design has become increasingly challenging due to the reducing noise margins and increased sensitivity to threshold voltage variations. These issues oppose our ability to achieve stable bitcells and acceptable performance while maintaining density using the standard six-transistor(6T) circuit. To overcome these challenges, researchers have proposed different topologies for SRAMs with single-ended 8T, 9T, 10T bitcell designs. These designs improve the cell stability in the subthreshold regime but suffer from bit-line leakage noise, placing constraints on the number of cells shared by each bitline. In this paper, we propose a novel 9T SRAM cell topology which achieves both cell stability as well as prevents bit-line leakage. With the proposed 9T SRAM circuit, the read static noise margin is nearly twice that of conventional 6T SRAM circuit. Furthermore, the bitline leakage power consumption of the proposed 9T SRAM cell is reduced by up to 79%, 76% and 39% when compared to the previously published 8T, 10T and 9T SRAM cells, respectively.
机译:由于降低噪声边距和对阈值电压变化的敏感度增加,纳米级SRAM存储器设计越来越具有挑战性。这些问题反对我们在使用标准六晶体管(6T)电路保持密度的同时实现稳定的位线和可接受的性能。为了克服这些挑战,研究人员提出了单一端8T,9T,10T位设计的SRAM的不同拓扑。这些设计改善了亚阈值制度中的细胞稳定性,但遭受位线泄漏噪声,对每个位线共享的小区数的限制。在本文中,我们提出了一种新的9T SRAM细胞拓扑,实现了细胞稳定性以及防止位线泄漏。利用所提出的9T SRAM电路,读取静态噪声裕度几乎是传统的6T SRAM电路的两倍。此外,与先前发表的8T,10T和9T SRAM细胞相比,所提出的9T SRAM池的位线漏功率耗竭高达79%,76%和39%。

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