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High J_c YBCO coated conductors on non-magnetic metallic substrate using YSZ-based buffer layer architecture

机译:高J_C YBCO涂覆导体在非磁性金属基板上使用YSZ基缓冲层架构

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Biaxially aligned YBa_2Cu_3O_(7-δ)(YBCO) thick films were deposited by pulsed laser ablation technique on cube textured non-magnetic Ni_(89)V_(11) (Ni-V) substrate, using CeO_2/YSZ/CeO_2/NiO buffer layer architecture. The first NiO seed layer was formed by epitaxial oxidation of the Ni-V substrate. Structural analyses show typical full width at half maximum values of Φ- and ω-scans less than 10°and 8°, respectively. The highest value obtained for the critical current density at 77 K and zero magnetic field was 6 x 10~5 A cm~(-2), which is close to that obtained for YBCO films grown on CeO_2/NiO buffer layer architecture.
机译:通过CEO_2 / YSZ / CEO_2 / NIO缓冲液对立方体纹理的非磁性NI_(89)V_(NI-V)衬底上的脉冲激光烧蚀技术沉积双轴对齐的YBA_2CU_3O_(7-Δ)厚膜沉积厚膜层架构。通过外延氧化Ni-V衬底形成第一NiO种子层。结构分析分别在φ-和ω-扫描的半个最大值下显示典型的全宽,分别小于10°和8°。在77K和零磁场处的临界电流密度获得的最高值为6×10〜5Acm〜(-2),接近在CEO_2 / NIO缓冲层架构上生长的YBCO薄膜获得的。

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