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Electrical conductive CVD diamond film as a new material for electrical contact

机译:导电CVD金刚石薄膜作为电接触的新材料

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Electrical conductive CVD diamond film was synthesized as a candidate for new electrical contact material. The distribution of the electrical resistance value [Ω] for all the diamond deposited samples is narrower than that of W plate, which was used as the substrate of the CVD diamond film. Moreover, some of the diamond-deposited samples had lower apparent electrical resistance than tungsten plate. Especially, the sample synthesized for 1 hour had small apparent electrical resistance, and the narrow distribution of the value. Therefore, we can think that diamond-deposited sample is a promising material for electrical contact.
机译:作为新电接触材料的候选,合成导电CVD金刚石薄膜。 对于所有金刚石沉积的样品的电阻值[ω]的分布比W板的较窄,其用作CVD金刚石膜的基材。 此外,一些金刚石沉积的样品比钨板具有较低的表观电阻。 特别是,合成1小时的样品具有小的表观电阻,并且该值的窄分布。 因此,我们可以认为钻石沉积的样品是用于电接触的有希望的材料。

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