X-ray interferometry technique using an X-ray microfocus laboratory source

摘要

X-ray reflecto-interferometry technique based on compound refractive lenses using an X-ray laboratory source was proposed to study thin-film structures. The setup for this experiment is very simple: a focused X-ray beam is reflected from parallel flat surfaces, which creates an interference pattern in a wide angular range, therefore the interference pattern can be obtained in a single shot without the need to rotate the sample or the detector. The reflecto-interferograms for Si_3N_4 membranes were obtained using the MetalJet Excillium micro-focus laboratory source with GaK_α emission line at 9.25 keV. The experimentally obtained film thickness is in good agreement with the declared characteristics.