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Conference on Advances in Metrology for X-Ray and EUV Optics

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1.High-speed characterization of refractive lenses with single-grating interferometry

机译：单光栅干涉测量折叠透镜的高速表征
- 作者：Xianbo Shi;Walan Grizolli;Deming Shu;Luca Rebuffi;Zahirul Islam;Lahsen Assoufid
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
2.A precise aperture centring device (ACenD) for autocollimator-based surface measuring profilers

机译：用于自动胶凝器的表面测量分析器的精确孔径定心装置（Acend）
- 作者：Bernd Grubert;David Kreitschik;Olaf Schnabel;Frank Siewert;Ralf. D. Geckeler;Matthias Schumann;Andreas Just;Michael Krause;Tanfer Yandayan;S. Asli Akgoz
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
3.Investigation on lateral resolution of surface slope profilers

机译：表面坡度分析器横向分辨率的研究
- 作者：Valeriy V. Yashchuk;Ian Lacey;Thomas Arnold;Hendrik Paetzelt;Simon Rochester;Frank Siewert;Peter Z. Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
4.Transfer of autocollimator calibration for use with scanning gantry profilometers for accurate determination of surface slope and curvature of state-of-the-art x-ray mirrors

机译：用于自动调用校准的转移，用于扫描龙门轮廓计，以精确确定表面斜率和最先进的X射线镜的曲率
- 作者：Ian Lacey;Kevan Anderson;Jeff Dickert;Ralf D. Geckler;Andreas Just;Frank Siewert;Brian V. Smith;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
5.Three-dimensional shape measurement of ellipsoidal mirror by industrial X-ray computed tomography

机译：工业X射线计算机断层扫描的椭圆镜镜镜的三维形状测量
- 作者：Satsuki Shimizu;Yoko Takeo;Gota Yamaguchi;Yutaka Ohtake;Yukie Nagai;Hidekazu Mimura
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
6.Controlling an active bimorph deformable mirror with sub-nanometre resolution

机译：用子纳米分辨率控制活性双压芯可变形镜
- 作者：Ioana-Theodora Nistea;Simon G. Alcock;Vivek Badami;Riccardo Signorato;Kawal Sawhney
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
7.The in-situ LTP window glass optomechanical analysis

机译：原位LTP窗玻璃光学力学分析
- 作者：Ming-Ying Hsu;Gung-Chian Yin;Chien-yu Lee;Bo-Yi Chen;Hok-Sum Fung;Shang-Wei Lin;Duan-Jen Wang;Yu-Shan Huang
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
8.New surface slope profiler with sub-millimeter spatial resolution

机译：具有亚毫米空间分辨率的新表面斜率分析器
- 作者：Fugui Yang;Ming Li;Quan Cai;Weifan Sheng;Peng Liu;Xiaowei Zhang
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
9.On the characterization of ultra-precise XUV-focusing mirrors by means of slope- measuring deflectometry

机译：通过斜率测量偏转测量来表征超精密XUV聚焦镜的特性
- 作者：Frank Siewert;Jana Buchheim;Grzegorz Gwalt;Jens Viefhausa
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
10.Metrology of MID offset mirrors before and after coating

机译：涂层前后中间偏移镜的计量
- 作者：M. Vannoni;A. Zozulya;I. Freijo Martin;S. Schmidtchen;A. Madsena;M. St?rmer
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
11.Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

机译：美国DOE光源的衍射限制光束线路光学系统的协同开发
- 作者：Kenneth A. Goldberg;Antoine Wojdyla;Diane Bryant;Weilun Chao;Daniele Cocco;Corey Hardin;Daniel Morton;May Ling Ng;Lance Lee;Lahsen Assoufid;Walan Grizolli;Xianbo Shi;Steve P. Kearney;Michael Wojcik;Yuri Shvyd’ko;Deming Shu;Mourad Idir;Lei Huang
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
12.EUV Stokes reflection polarimeter using gold coated mirrors for use up to 150 eV photon energy

机译：EUV Stokes使用金色涂层镜子的反射偏振仪，用于使用高达150 eV光子能量
- 作者：Gillian Black;Xiaoyu Cui;Sergey Gorovikov;Feizhou He;Grant Henneberg;Michael A. MacDonald;Brian Yates;Lucia Zuin
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
13.Stress releasing procedure approach for an X-ray mirror holder for round-robin measurements

机译：用于循环测量的X射线镜支架的应力释放程序方法
- 作者：S. Schmidtchen;M. Vannoni;I. Freijo Martin;D. La Civita;H. Sinn
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
14.First commissioning results of the KB mirrors at the SCS instrument of the European XFEL

机译：欧洲XFEL的SCS仪器的KB镜像的首次调试结果
- 作者：G. Mercurio;C. Broers;R. Carley;J. T. Delitz;N. Gerasimova;L. Le Guyarder;L.Mercadier;A. Reich;J. Schlappa;M. Teichmann;A. Yaroslavtsev;M. Cascella;K.Setoodehnia;M. Schneider;B. Pfau;S. Eisebitt;V. Vozda;V. Hajkova;L. Vysin;T.Burian;J. Chalupsky;L. Juha;S. G. Alcock;I. Nistea;D. La Civita;H. Sinn;M.Vannoni;A. Scherz
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
15.Ion Beam Figuring and Optical Metrology System for Synchrotron X-ray Optics

机译：用于同步X射线光学器件的离子束图和光学计量系统
- 作者：Matthew Hand;Simon G. Alcock;Michael Hillman;Richard Littlewood;Simone Moriconi;Hongchang Wang;Kawal Sawhney
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
16.Transparent Element Surface Measurement Using Binary Pattern in Phase-Measuring Deflectometry

机译：透明元件表面测量使用相位测量偏转测量中的二进制图案
- 作者：Ruiyang Wang;Dahai Li
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
17.The Optical Metrology Laboratory at Diamond: pushing the limits of nano-metrology

机译：钻石的光学计量实验室：推动纳米计量的限制
- 作者：Ioana-Theodora Nistea;Simon G. Alcock;Murilo Bazan da Silva;Kawal Sawhney
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
18.High-accuracy autocollimator calibration by interferometric 2D angle generator

机译：干涉式2D角发生器的高精度自动调用器校准
- 作者：V. Heikkinen;V. Byman;M. Shpak;R. Geckeler;A. Just;M. Krause;M. Schumann;A. Lassil
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
19.Diffraction compensation of slope errors on strongly curved grating substrates

机译：强弯曲光栅基板上的斜率误差的衍射补偿
- 作者：Christoph Braig;Juergen Probst;Enrico Langlotz;Ilko Rahneberg;Michael Kühnel;Alexei Erko;Thomas Krist;Christian Seifert
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
20.One-dimensional ion-beam guring solution from Brookhaven National Laboratory

机译：Brookhaven国家实验室的一维离子束采用解决方案
- 作者：Tianyi Wang;Lei Huang;Matthew Vescovi;Dennis Kuhne;Kashmira Tayabaly;Nathalie Bouet;Mourad Idir
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2019年
21.Absolute flatness measurements by Fizeau interferometer and 3D scanning deflectometric profiler

机译：Fizeau Tenferometer和3D扫描偏转谱仪的绝对平坦度测量
- 作者：Yohan Kondo;Youichi Bitou
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- flatness;
- surface topography;
- deflectometry;
- angle;
- Fizeau interferometer;
22.Raytracing the Long Trace Profiler

机译：光线跟踪长跟踪分析
- 作者：Peter Z. Takacs;Ian Lacey;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- Long Trace Profiler;
- synchrotron radiation;
- calibration;
- metrology of x-ray optics;
- surface metrology;
- slope profilometry;
- optical design;
- raytrace;
23.Multifunctional light beam source for surface slope measuring long trace profilers

机译：用于表面斜率的多功能光束源测量长跟踪分析器
- 作者：Valeriy V. Yashchuk;Ian Lacey;Kevan Anderson;Jeff Dickert;Brian V. Smith;Peter Z. Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- x-ray optics;
- optical metrology;
- surface slope profilometry;
- LTP;
- pencil beam interferometry;
- light beam source;
- optical sensor;
- error reduction;
24.Uncertainty of Figure Error Measurement by Non-Contact Three Dimensional Nano-profiler Using Normal Vector Tracing Method

机译：使用常规矢量跟踪方法的非接触式三维纳米分布器测量的图形误差的不确定性
- 作者：Kota Hashimoto;Takeshi Ashizawa;Mikiya Ikuchi;Katsuyoshi Endo
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- Three Dimensional Profiler;
- Optical Element;
- Uncertainty;
- Non-Contact;
- Absolute measurement;
25.Surface metrology of cylindrical mirrors with sagittal curvature in low spatial frequency range

机译：低空间频率范围内矢状镜的表面计量
- 作者：Artur C. Pinto;Bernd C. Meyer;Sergio A. L. Luiz;Yuri R. Tonin;Regis S. de Oliveira;Flavio A. Borges;Lucas M. Volpe;Gabriel V. Claudiano;Renan R. Geraldes
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- X-ray optics;
- optical metrology;
- LTP;
- surface interferometry;
- sagittal cylindrical mirrors;
26.Development of high precision mirrors using algorithm-based stitching interferometry and profile coating technique

机译：基于算法的缝合干涉测定和型材涂层技术的高精度镜开发
- 作者：Qiaoyu Wu;Qiushi Huang;Yingna Shi;Xudong Xu;Runze Qi;Zhong Zhang;Yumei He;Jie Wang;Zhanshan Wang
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- High precision X-ray mirrors;
- stitching interferometry;
- profile coating;
27.Characterization of groove density variation of VLS gratings with ALS XROL LTP-Ⅱ in different operation modes

机译：不同运行模式中与ALS XROL LTP-Ⅱ的VLS光栅的沟槽密度变化的表征
- 作者：Ian Lacey;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- x-rays;
- slope metrology;
- long trace profiler;
- LTP;
- diffraction measurements;
- x-ray grating;
- variable-line-spacing;
- VLS grating;
28.Reflective optics for EUV/x-ray sources at Thales SESO: possibilities and perspectives

机译：Thales Seso的EUV / X射线源的反光光学器件：可能性和观点
- 作者：Luca PEVERINI;H. Guadalupi;T. Michel;S. Perrin;R. Neviere;Christian du Jeu
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- Optics fabrication;
- X-ray reflective optics;
- Synchrotron;
- beam conditioning;
29.X-ray interferometry technique using an X-ray microfocus laboratory source

机译：X射线干涉测量技术使用X射线微焦点实验室来源
- 作者：M. Voevodina;S. Lyatun;A. Barannikov;I. Lyatun;I. Snigireva;A. Snigirev
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- X-ray interferometry;
- compound refractive lenses;
- reflecto-interferometry;
- spatial resolution;
30.Design of two-stage soft-X-ray nano-focusing system with a ring-focusing mirror and a quasi-Wolter mirror

机译：具有环形聚焦镜的两级软X射线纳米聚焦系统的设计和准螺旋镜
- 作者：Yoko Takeo;Hiroto Motoyama;Takenori Shimamura;Takashi Kimura;Takehiro Kume;Yusuke Matsuzawa;Takahiro Saito;Yoichi Imamura;Hiroaki Miyashita;Kentaro Hiraguri;Hirokazu Hashizume;Yasunori Senba;Hikaru Kishimoto;Haruhiko Ohashi;Hidekazu Mimura
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- Focusing optics;
- Ring-focusing mirror;
- Wolter mirror;
- Soft X-ray;
- SPring-8;
- Ptychography;
- Wavefront sensing;
31.Single-shot speckle tracking method based on wavelet transform and multi-resolution analysis

机译：基于小波变换和多分辨率分析的单次散斑跟踪方法
- 作者：Zhi Qiao;Xianbo Shi;Lahsen Assoufid
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- Speckle tracking;
- wavelet transform;
- multi-resolution;
- wavefront;
- metrology;
32.Design of Ultrashort Kirkpatrick-Baez Mirror for Soft X-Ray Nanofocusing

机译：柔软X射线纳米焦的Ultrashort Kirkpatrick-Baez镜设计
- 作者：Takenori Shimamura;Yoko Takeo;Takashi Kimura;Hirokazu Hashizume;Yasunori Senba;Hikaru Kishimoto;Haruhiko Ohashi;Hidekazu Mimura
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- soft X-ray;
- focusing optic;
- short focal length;
- ultrashort Kirkpatrick-Baez (KB) mirror;
- SPring-8;
33.X-ray wavefront characterization with grating interferometry using an x-ray microfocus laboratory source

机译：使用X射线微胶质实验室源具有光栅干涉测量的X射线波前表征
- 作者：ZHAO Shuai;WANG Ke-yi;CHENG Guang-yu;SHEN Yuan;WANG Yu-shan;ZHANG Lei
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2020年
- X-ray imaging;
- Talbot effect;
- X-ray optics;
- Grating interferometry;
- Phase retrieval;
34.On the choice of a metrological instrument for Synchrotron Radiation optics

机译：关于同步辐射光学元件测量仪的选择
- 作者：G. Sostero;D. Cocco;A. Bianco
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- profilometry;
- optical metrology;
- long trace profiler;
- x-ray optics;
35.A New Designed Ultra-high Precision Profiler

机译：一个新的设计超高精度分析器
- 作者：Y.HIGASHI;Y.TAKAIE;K.ENDO;T.KUME;K.ENAMI;K.YAMAUCHI;K.YAMAMURA;H.SANO;K.UENO;Y.MORI
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- surface figuring;
- slope error;
- normal vector;
- goniometers;
- asymmetric aspheric figure;
36.Latest metrology results with the SOLEIL synchrotron LTP

机译：最新的计量结果与Soleil Synchrotron LTP
- 作者：Muriel Thomasset;Sylvain Brochet;Francois Polack
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- long trace profiler;
- surface figure;
- slope errors;
- mirror;
- grating;
- absolute calibration;
37.Advanced metrology, an essential support for the surface finishing of high performance x-ray optics

机译：先进的计量，对高性能X射线光学器件表面整理的基本支持
- 作者：Frank Siewert;Heiner Lammert;Tino Noll;Thomas Schlegel;Thomas Zeschke;Thomas Haensel;Andreas Nickel;Axel Schindler;Bernd Grubert;Carsten Schlewitt
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- X-ray optics;
- NOM;
- LTP;
- ion beam figuring;
- metrology;
38.Cross-check of different techniques for two-dimensional power spectral density measurements of x-ray optics

机译：X射线光学二维功率谱密度测量不同技术的交叉检查
- 作者：Valeriy V. Yashchuk;Steve C. Irick;Eric M. Gullikson;Malcolm R. Howells;Alastair A. MacDowell;Wayne R. McKinney;Farhad Salmassi;Tony Warwick
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
39.Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories

机译：APS，ESRF和Spring-8光学计量实验室的X射线镜循环计量测量结果
- 作者：Lahsen Assoufid;Amparo Rommeveaux;Haruhiko Ohashi;Kazuto Yamauchi;Hidekazu Mimura;Jun Qian;Olivier Hignette;Tetsuya Ishikawa;Christian Morawe;Albert Macrander;AH Khounsary;Shunji Goto
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- long trace profiler;
- round robin;
- surface metrology;
- x-ray mirrors;
- synchrotron radiation;
40.First report on a European Round Robin for slope measuring profilers

机译：关于欧洲循环的第一次报告斜坡测量分析仪
- 作者：Amparo Rommeveaux;Muriel Thomasset;Daniele Cocco;Frank Siewert
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- LTP;
- optical surface;
- metrology;
- cross comparison;
- standard reference;
41.Flat-field calibration of CCD detector for Long Trace Profiler

机译：用于长跟踪分析器的CCD检测器的平局校准
- 作者：Jonathan L. Kirschman;Edward E. Domning;Keith D. Franck;Steven C. Irick;Tony Warwick;Valeriy V. Yashchuk;Alastair A. MacDowell;Wayne R. McKinney;Gregory Y. Morrison;Brian V. Smith
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- long trace profiler;
- LTP;
- LTP detector;
- camera calibration;
- flat field source;
- error reduction;
- optical metrology;
42.Flat-field calibration of CCD detector for long trace profiler

机译：用于长跟踪分析器的CCD检测器的平局校准
- 作者：Jonathan L. Kirschman;Edward E. Domning;Keith D. Franck;Steven C. Irick;Alastair A. MacDowell;Wayne R. McKinney;Gregory Y. Morrison;Brian V. Smith;Tony Warwick;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- long trace profiler;
- LTP;
- LTP detector;
- camera calibration;
- flat field source;
- error reduction;
- optical metrology;
43.A Microstitching Interferometer for Evaluating the Surface Profileof Precisely Figured Hard X-ray K-B Mirrors

机译：用于评估表面剖面的微型切割干涉仪，精确地设计了硬X射线K-B镜子
- 作者：Lahsen Assoufid;Jim Qian;Cameron M. Kewish;Chian Liu;Ray Conley;Albert T. Macrander;Delvin Lindley;and Christopher Saxer
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- microstitching;
- elliptical x-ray mirror;
- profile-coating;
- long trace profiler;
44.A microstitching interferometer for evaluating the surface profile of precisely figured x-ray K-B mirrors

机译：用于评估精确图X射线K-B镜子的表面曲线的微型干涉干涉仪
- 作者：Lahsen Assoufid;Jun Qian;Cameron M. Kewish;Chian Liu;Ray Conley;Albert T. Macrander;Delvin Lindley;Christopher Saxer
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- microstitching;
- elliptical x-ray mirror;
- profile-coating;
- Long Trace Profiler;
- Conespondance;
45.Proposal for a universal test mirror for characterization of slope measuring instruments

机译：用于坡度测量仪器表征的通用测试镜的提案
- 作者：Valeriy V. Yashchuk;Wayne R. McKinney;Tony Warwick;Tino Noll;Frank Siewert;Thomas Zeschke;Ralf D. Geckeler
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- slope measuring instrument;
- long trace profiler;
- LTP;
- calibration;
- systematic error reduction;
- test mirror;
46.Optimized use and calibration of autocollimators in deflectometry

机译：偏转测量中的自动调用器的优化使用和校准
- 作者：Ralf D. Geckeler;Andreas Just
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- Deflectometry;
- autocollimator;
- angle;
- angle calibration;
- traceability;
- flatness standard;
- precision metrology;
47.Optimized Use and Calibration of Autocollimators in Deflectometry

机译：偏转测量中的自动调用器的优化使用和校准
- 作者：Ralf D. Geckeler;Andreas Just
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- deflectometry;
- autocollimator;
- angle;
- angle calibration;
- traceability;
- flatness standard;
- precision metrology;
48.Precision Tiltmeter as a Reference for Slope Measuring Instruments

机译：精密TILTMETER作为斜坡测量仪器的参考
- 作者：Jonathan L. Kirschman;Edward E. Domning;Gregory Y. Morrison;Brian V. Smith;and Valeriv V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- tiltmeter;
- slope measuring instrument;
- long trace profiler;
- LTP;
- error reduction;
- reference;
- x-ray optics;
- optical metrology;
49.New Procedures for the Adjustment of Elliptically Bent Mirrors with the Long Trace Profiler

机译：用长跟踪分析器调整椭圆弯曲镜子的新程序
- 作者：Wayne R. McKinney;Steven C. Irick;Jonathan L. Kirschman;Alastair A. MacDowell;Tony Warwick;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- synchrotron radiation;
- elliptical bender;
- mirror;
- adaptive optic;
- x-ray;
- long trace profiler;
50.New procedures for the adjustment of elliptically bent mirrors with the long trace profiler

机译：用长跟踪分析器调整椭圆弯曲镜子的新程序
- 作者：Wayne R. McKinney;Steven C. Irick;Jonathan L. Kirschman;Alastair A. MacDowell;Tony Warwick;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- synchrotron radiation;
- elliptical bender;
- mirror;
- adaptive optic;
- x-ray;
- Long Trace Profiler;
51.Precision tiltmeter as a reference for slope measuring instruments

机译：精密TILTMETER作为斜坡测量仪器的参考
- 作者：Jonathan L. Kirschman;Edward E. Domning;Gregory Y. Morrison;Brian V. Smith;Valeriy V. Yashchuk
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- tiltmeter;
- slope measuring instrument;
- long trace profiler;
- LTP;
- error reduction;
- reference;
- X-ray optics;
- optical metrology;
52.Proposal for a Universal Test Mirror for Characterization of Slope Measuring Instruments

机译：用于坡度测量仪器表征的通用测试镜的提案
- 作者：Valeriy V. Yashchuk;Wayne R. McKinney;Tony Warwick;Tino Noll;Frank Siewert;Thomas Zeschke;Ralf D. Geckeler
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- slope measuring instrument;
- long trace profiler;
- LTP;
- calibration;
- systematic error reduction;
- test mirror;
53.Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors

机译：APS的第二计量循环，ESRF和椭圆形硬X射线镜的ESRF和Spring-8实验室
- 作者：A. Rommeveaux;L. Assoufid;H. Ohashi;H. Mimura;K. Yamauchi;J. Qian;T. Ishikawa;C. Morawe;A. T. Macrander;A. Khounsary;S. Goto
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- long trace profiler;
- round robin;
- x-ray mirrors;
- interferometer;
- stitching;
54.Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors

机译：APS的第二计量循环，ESRF和椭圆形硬X射线镜的ESRF和Spring-8实验室
- 作者：A. Rommeveaux;L. Assoufid;H. Ohashi;H. Mimura;K. Yamauchi;J. Qian;T. Ishikawa;C. Morawe;A. T. Macrander;A. Khounsary;S. Goto
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- Long Trace Profiler;
- round robin;
- x-ray mirrors;
- interferometer;
- stitching;
55.New optical setup for the generation of variable spot size on third generation synchrotron beamlines

机译：新的光学设置为第三代同步rotron BeAClines上的可变光斑大小的产生
- 作者：Thierry Moreno;Rachid Belkhou;Gilles Cauchon;Mourad Idir
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- intensity modulations;
- variable spot sizes;
- X-ray zoom;
- slope errors;
56.Multiple functions Long Trace Profiler (LTP-MF) for National Synchrotron Radiation Laboratory of China

机译：中国国家同步辐射实验室的多种函数长跟踪分析器（LTP-MF）
- 作者：Shinan Qian;Qiuping Wang;Yilin Hong;Peter Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
57.X-ray beam metrology and X-ray optic alignment by Hartmann wavefront sensing

机译：Hartmann波前感测的X射线光束计量和X射线光学校准
- 作者：Pascal Mercere;Samuel Bucourt;Gilles Cauchon;Denis Douillet;Guillaume Dovillaire;Kenneth A. Goldberg;Mourad Idir;Xavier Levecq;Thierry Moreno;Patrick P. Naulleau;Senajith Rekawa;Philippe Zeitoun
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
58.A second optic head for the ELETTRA Long Trace Profiler

机译：Elettra Long Trace Profiler的第二个视镜头
- 作者：Daniele Cocco;Anna Bianco;Giovanni Sostero
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- long trace profiler;
- systematic errors;
- short radius mirrors;
59.Scanning Form Measurement for Curved Surfaces

机译：弯曲表面的扫描形式测量
- 作者：Michael Schulz;Ralf D. Geckeler
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- scanning;
- topography;
- form measurement;
- angular measurement;
- low uncertainty;
- high resolution;
- high accuracy;
60.Surface figuring and measurement methods with spatial resolution close to 0.1mm for X-ray mirror fabrication

机译：具有空间分辨率的表面图和测量方法，用于X射线镜制造的0.1mm
- 作者：H. Mimura;H. Yumoto;S. Matsuyama;K. Yamamura;Y. Sano;K. Endo;Y. Mori;Y. Nishino;M. Yabashi;K. Tamasaku;T. Ishikawa;K. Yamauchi
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- coherent X-ray;
- hard X-ray focusing;
- figure correction;
- EEM;
- MSI;
- RADSI;
61.Metrology for the Development of High-Energy X-Ray Optics

机译：高能X射线光学发展的计量
- 作者：Mikhail Gubarev;Brian Ramsey;Darell Engelhaupt;Chet Speegle;Martin Smithers
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- x-ray optics;
- x-ray optics metrology;
- electroform-nickel replication;
- figure measurements;
62.High performance Fizeau and scanning white-light interferometers for mid-spatial frequency optical testing of free-form optics

机译：高性能等法和扫描白光干涉器，用于自由形状光学的中间空间频率光学测试
- 作者：Leslie L. Deck;Chris Evans
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- interferometry;
- phase shifting;
- metrology;
63.Mirror metrology and bender characterization at ESRf

机译：ESRF的镜像计量和弯曲性格
- 作者：Amparo Rommeveaux;Olivier Hignette;Christian Morawe
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- X-ray mirrors;
- LTP;
- kirkpatrick-baez;
- shaping mirrors;
64.Real-time stability and profile comparison measurements between two different LTPs

机译：两个不同的LTP之间的实时稳定性和轮廓比较测量
- 作者：Shinan Qian;Duan Jen Wang
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
65.Cylinder lens alignment in the LTP

机译：LTP中的圆柱镜头对齐
- 作者：Peter Z. Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- long trace profiler;
- LTP;
- profilometry;
- alignment;
- aspheric optics;
- metrology;
66.Comparisons between EUV at-wavelength metrological methods

机译：EUV与波长计量方法之间的比较
- 作者：Katsumi Sugisaki;Masashi Okada;Yucong Zhu;Katsura Otaki;Zhiqiang Liu;Jun Kawakami;Mikihiko Ishii;Jun Saito;Katsuhiko Murakami;Masanobu Hasegawa;Chidane Ouchi;Seima Kato;Takayuki Hasegawa;Akiyoshi Suzuki;Hideo Yokota;Masahito Niibe;Mitsuo
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2005年
- optical testing;
- interferometry;
- point diffraction interferometer;
- lateral shearing interferometer;
- EUV lithography;
67.Comparison of slope and height profiles for flat synchrotron x-ray mirrors measured with a long trace profiler and a PMI Fizeau interferometer

机译：用长跟踪分析器和PMI Fizeau干涉仪测量的扁平同步X射线镜斜率和高度曲线的比较
- 作者：Jun Qian;Lahsen Assoufid;Albert Macrander
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- long trace profiler;
- LTP;
- phase measuring interferometer;
- PMI;
- Fizeau interferometer;
- synchrotron x-ray mirror;
68.Systematic error reduction: non-tilted reference beam method for Long Trace Profiler

机译：减少系统误差：长跟踪分析器的非倾斜参考光束方法
- 作者：Shinan Qian;Kun Qian;Yiling Hong;Liusi Sheng;Tonglin Ho;Peter Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
69.Comparison of slope and height profiles for flat synchrotron x-ray mirrors measured with a long trace profiler and a PMI Fizeau interferometer

机译：用长跟踪分析器和PMI Fizeau干涉仪测量的扁平同步X射线镜斜率和高度曲线的比较
- 作者：Jun Qian;Lahsen Assoufid;Albert Macrander
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- long trace profiler;
- LTP;
- phase measuring interferometer;
- PMI;
- Fizeau interferometer;
- synchrotron x-ray mirror;
70.Systematic error reduction: non-tilted reference beam method for long trace profiler

机译：减少系统误差：长跟踪分析器的非倾斜参考光束方法
- 作者：Shinan Qian;Kun Qian;Yiling Hong;Liusi Sheng;Tonglin Ho;Peter Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
71.Suppressing vibration errors in phase-shifting interferometry

机译：抑制相移干涉测量中的振动误差
- 作者：Leslie L. Deck
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
72.Suppressing vibration errors in phase-shifting interferometry

机译：抑制相移干涉测量中的振动误差
- 作者：Leslie L. Deck
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
73.Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

机译：硬X射线纳米焦点的硬X射线波前测量和控制
- 作者：Soichiro Handa;Hidekazu Mimura;Satoshi Matsuyama;Hirokatsu Yumoto;Takashi Kimura;Yasuhisa Sano;Kenji Tamasaku;Yoshinori Nishino;Makina Yabashi;Tetsuya Ishikawa;Kazuto Yamauchi
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- hard x-ray mirror;
- x-ray nanofocusing;
- phase-error correction;
- differential deposition;
- at-wavelength wavefront metrology;
74.Surface gradient integrated profiler for x-ray and EUV optics: self calibration method of measured position for an off-axis parabolic mirror (f=150mm) measurement

机译：X射线和EUV光学器件的表面梯度集成分析器：自校准方法对于轴外抛物线镜（F = 150mm）测量的测量位置
- 作者：Y. Higashi;K. Endo;T. Kume;K. Enami;. Uchikoshi;K. Ueno;Y. Mori
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- surface figuring;
- slope error;
- normal vector;
- goniometer;
- asymmetric aspheric shape;
75.Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror

机译：用于半米长的X射线镜的微型切割干涉仪和相对角度可确定的缝合干涉仪
- 作者：Haruhiko Ohashi;Takashi Tsumura;Hiromi Okada;Hidekazu Mimura;Tatsuhiko Masunaga;Yasunori Senba;Shunji Goto;Kazuto Yamauchi;Tetsuya Ishikawa
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- X-ray;
- synchrotron radiation;
- mirror;
- stitching interferometr;
76.Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long X-ray mirror

机译：用于半米长的X射线镜的微型切割干涉仪和相对角度可确定的缝合干涉仪
- 作者：Haruhiko Ohashi;Takashi Tsumufa;Hiromi Okada;Hidekazu Mimura;Tatsuhiko Masunaga;Yasunori Senba;Shunji Goto;Kazuto Yamauchi;Tetsuya Ishikawa
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- x-ray;
- synchrotron radiation;
- mirror;
- stitching interferometer;
77.Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

机译：硬X射线纳米焦点的硬X射线波前测量和控制
- 作者：Soichiro Handa;Hidekazu Mimura;Satoshi Matsuyama;Hirokatsu Yumoto;Takashi Kimura;Yasuhisa Sano;Kenji Tamasaku;Yoshinori Nishino;Makina Yabashi;Tetsuya Ishikawa;Kazuto Yamauchi
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- hard x-ray mirror;
- x-ray nanofocusing;
- phase-error correction;
- differential deposition;
- at-wavelength wavefront metrology;
78.Surface Gradient Integrated Profiler for X-ray and EUV optics - Self calibration method of measured position for an off-axis parabolic mirror (f=150mm) measurement

机译：X射线和EUV光学器件的表面梯度集成分析器 - 用于离轴抛物线镜（F = 150mm）测量的测量位置的自校准方法
- 作者：Y.Higshi;K.Endo;T.Kume;K.Enmi;J. Uhikoshi K. Ueno;Y.Mori
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- surface figuring;
- slope error;
- normal vector;
- goniometer;
- asymmetric aspheric shape;
79.Binary pseudo-random grating as a standard test surface for measurement of modulation transfer function of interferometric microscopes

机译：二进制伪随机光栅作为用于测量干涉显微镜调制传递函数的标准测试表面
- 作者：Valeriy V. Yashchuk;Wayne R. McKinney;Peter Z. Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
80.Binary pseudo-random grating as a standard test surface for measurement of modulation transfer function of interferometric microscopes

机译：二进制伪随机光栅作为用于测量干涉显微镜调制传递函数的标准测试表面
- 作者：Valeriy V. Yashchuk;Wayne R. McKinney;Peter Z. Takacs
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
81.Recent developments on the Daresbury Laboratory long trace profiler

机译：Daresbury实验室长跟踪探究者的最新发展
- 作者：A. Gleeson
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- LTP;
- profiler;
- stability;
- temperature;
- vibration;
82.Recent developments on the Daresbury Laboratory long trace profiler

机译：Daresbury实验室长跟踪探究者的最新发展
- 作者：A. Gleeson
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- LTP;
- profiler;
- stability;
- temperature;
- vibration;
83.Progress in the X-ray Optics Metrology lab at Diamond Light Source

机译：钻石光源X射线光学和计量实验室的进展
- 作者：Simon. G. Alcock;K. J. S. Sawhney
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- x-ray optics;
- metrology;
- interferometry;
84.Progress in the x-ray optics and metrology lab at Diamond Light Source

机译：钻石光源X射线光学和计量实验室的进展
- 作者：Simon G. Alcock;K. J. S. Sawhney
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
- X-ray optics;
- metrology;
- interferometry;
85.High order harmonics wavefront measurement and optimization

机译：高阶谐波波前测量和优化
- 作者：J. Gautier;A. S. Morlens;P. Zeitoun;E. Papalarazou;G. Rey;C. Valentin;J. P. Goddet;S. Sebban;Guillaume Dovillaire;Xavier Levecq;Samuel Bucourt
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年
86.High order harmonics wave front measurement and optimization

机译：高阶谐波波前测量和优化
- 作者：J. Gautier;A.S Morlens;P. Zeitoun;E. Papalarazou;G.Rey;C. Valentin;J.P Goddet;S. Sebban;Guillaume Dovillaire;Xavier Levecq;Samuel Bucourt
- 会议名称：《Conference on Advances in Metrology for X-Ray and EUV Optics》 | 2007年