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Enhancing carrier injection in the active region of a 280nm emission wavelength LED using graded hole and electron blocking layers

机译:使用渐变的空穴和电子阻挡层来增强280nm发射波长LED的有源区中的载流子注入

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A theoretical investigation of AlGaN UV-LED with band engineering of hole and electron blocking layers (HBL and EBL, respectively) was conducted with an aim to improve injection efficiency and reduce efficiency droop in the UV LEDs. The analysis is based on energy band diagrams, carrier distribution and recombination rates (Shockley-Reed-Hall, Auger, and radiative recombination rates) in the quantum well, under equilibrium and forward bias conditions. Electron blocking layer is based on Al_aGa_(1-a)N / Al_(b→c)Ga_(1-b→1-c)N / Al_dGa_(1-d)N, where a>d>b>c. A graded layer sandwiched between large bandgap AlGaN materials was found to be effective in simultaneously blocking electrons and providing polarization field enhanced carrier injection. The graded interlayer reduces polarization induced band bending and mitigates the related drawback of impediment of holes injection. Similarly on the n-side, the Al_(x→y)Ga_(1-x→1-y)N / Al_zGa_(1-z)N (x < z < y) barrier acts as a hole blocking layer. The reduced carrier leakage and enhanced carrier density in the active region results in significant improvement in radiative recombination rate compared to a structure with the conventional rectangular EBL layers. The improvement in device performance comes from meticulously designing the hole and electron blocking layers to increase carrier injection efficiency. The quantum well based UV-LED was designed to emit at 280nm, which is an effective wavelength for water disinfection application.
机译:进行了具有空穴和电子阻挡层(分别为HBL和EBL)的能带工程的AlGaN UV-LED的理论研究,目的是提高注入效率并减少UV LED的效率下降。该分析基于在平衡和正向偏置条件下量子阱中的能带图,载流子分布和复合率(Shockley-Reed-Hall,Auger和辐射复合率)。电子阻挡层基于Al_aGa_(1-a)N / Al_(b→c)Ga_(1-b→1-c)N / Al_dGa_(1-d)N,其中a> d> b> c。发现夹在大带隙AlGaN材料之间的渐变层可有效地同时阻挡电子并提供极化场增强的载流子注入。渐变的中间层减少了极化引起的能带弯曲,并减轻了空穴注入障碍的相关缺点。类似地,在n侧,Al_(x→y)Ga_(1-x→1-y)N / Al_zGa_(1-z)N(x <z <y)势垒用作空穴阻挡层。与具有常规矩形EBL层的结构相比,在有源区中减少的载流子泄漏和增加的载流子密度导致辐射复合率的显着改善。器件性能的改善来自精心设计的空穴和电子阻挡层,以提高载流子注入效率。基于量子阱的UV-LED设计为在280nm处发射,这是用于水消毒应用的有效波长。

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