Graphene has risen to prominence as a scientifically intriguing material with tremendous potential, making its fabrication a key research area. An intriguing and innovative route to its synthesis is the use of focused ion beam irradiation to achieve spatially patterned reduction of graphene oxide. Here we explore the sensitivity of this approach, analysing the key parameter of ion fluence through a systematic study, ranging from 0-0.204 nC/μm~2. We characterize the regimes of preferential reduction and amorphisation, and analyzing changes in the materials bulk conductivity and Raman spectra, as it progresses through these regimes.
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