Effect of substrate temperature on high rate deposited ZnO∶Al films by magnetron sputtering

摘要

A series of ZnO∶Al (AZO) thin films was prepared on quartz at different substrate temperature using magnetron sputtering with high deposited rate of 67 nm/min.The structural,electrical and optical properties of these films were investigated as a function of substrate deposition temperature ranging from room temperature to 500 °C.The surface micrograph of AZO film deposited at room temperature was measured by a scanning electron microscope (SEM) and an atomic force microscope (AFM).The results of X-ray diffraction (XRD) test show that all the films have a (002) preferential orientation.The best electrical property was obtained at 500 °C,the resistivity was 9.044× 10-4 ohm·cm,and the corresponding carrier concentration and mobility were 3.379×1020/cm3 and 20.45 m2/Ns,respectively.What's more,all the films show a high optical transmittance.