Lithography mask made by silver nanorods

摘要

Lithography is a key process in fabrication of semiconductors, especially, it plays the main role in the size of integrated circuit. Because of the diffraction limit, the size of lithography image cannot be shrunk less than wavelength. In this paper, we offer a practical method to get a subwavelength image by using visible light. This method is based on the localized surface plasmon among silver nanorods, if the conditions of the polarization of light and configuration of the nanorod mask are optimized.