Advanced at-wavelength reflectometry with the EUV tube

摘要

Reliable and compact extreme ultraviolet (EUV) laboratory sources are strongly required for a fast in-house characterization of optical components and for the precise calibration of EUV diagnostic instruments. The EUV tube, based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range, promises to become an important tool for these applications. Silicon targets are used to generate radiation at 13.5 nm. Great benefits of this source are a compact and flexible design, debris-free operation, and high temporal and spatial long-term stability. Detailed characteristics of the source performance are reported and different examples for off-synchrotron at-wavelength metrology are presented.