Film Quantum Yields of EUV Ultra-High PAG Photoresists

摘要

Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV-2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure thedensity of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levelsof PAG show divergent mechanisms for production of photoacids beyond PAG concentrations of 0.35 moles/liter. TheFQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQYs that increase beyond PAGconcentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generated/EUV photons absorbed.