High Resolution Nanoimprint Templates for Dual Damascene —Fabrication and Imprint Results

摘要

A dual damascene template fabrication process has been developed, which enables the structuring of high-resolution,high-aspect pillars on top of lines. Based on this technology templates with three different designs have been fabricatedand characterized. Two templates are dedicated for an assessment of the fabrication process using a regular test designon one hand and an arbitrary CMOS design on the other hand. With the third template via chains shall be later realized asdemonstrator for electrical tests. The templates have been imprinted in resist and sacrificial material on an Imprio 55 andan Imprio 100 tool. The usability of each fabricated template could be confirmed for the specific application. For thetemplate manufacturing a Vistec variable shape e-beam (VSB) writer SB352HR and appropriate positive-tone andnegative-tone chemically amplified resists (CAR) have been used.