Nanostructured indium tin oxide for application in optoelectronic devices

摘要

Nanostructured thin films of indium tin oxide were grown using glancing angle deposition, a physical vapour deposition technique which enables the preparation of columnar thin films with various morphologies. Indium tin oxide films consisting of vertical posts were electrically characterized using a probing station to determine their electrical resistivity. The nanostructured films were found to exhibit resistivities approximately two orders of magnitude greater than that of a normally evaporated film. However, development of the measurement technique is ongoing, and several ideas for improvement are described.