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Measured Energy and Angular Distributions of Sputtered Neutral Atoms from a Ga-In Eutectic Alloy Target

机译:Ga-In共晶合金靶的溅射中性原子的测得能量和角分布

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The energy and angular distributions of ground-state neutral atoms sputtered from the surface of a liquid Ga-In eutectic alloy by normally-incident 25 keV Ar~+ have been measured using the technique of sputter-initiated resonance ionization spectroscopy (SIRIS). Details of the measurements and data analysis are presented. Differences between the distributions for the Ga and In atoms are discussed in the context of the extreme Gibbsian segregation of the alloy surface.
机译:利用溅射引发共振电离光谱技术(SIRIS)测量了常态入射的25 keV Ar〜+从液态Ga-In共晶合金表面溅射出的基态中性原子的能量和角分布。介绍了测量和数据分析的详细信息。在合金表面的极吉布斯偏析的背景下,讨论了Ga和In原子的分布之间的差异。

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