HIGH PURITY Co-Fe ALLOY SPUTTERING TARGET, MAGNETIC THIN FILM DEPOSITED BY USING SAME SPUTTERING TARGET AND METHOD FOR PRODUCING SAME HIGH PURITY Co-Fe ALLOY SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a means for depositing a ferromagnetic film which has little leakage of gas and generation of particles on sputtering, has excellent corrosion resistance, and further has satisfactory magnetic properties.;SOLUTION: The high purity Co-Fe alloy sputtering target has an oxygen content of ≤30 ppm, and Al, Si and Cu contents respectively of ≤30 ppm. The magnetic thin film is deposited by using the same sputtering target.;COPYRIGHT: (C)2003,JPO