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Study of Coating Defects and their Influence on Corrosion and Tribological Properties of HIPIMS Deposited CrN/NbN Coatings

机译:HIPIMS沉积CrN / NbN涂层的涂层缺陷及其对腐蚀和摩擦学性能的影响的研究

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It has been reported that compared to state-of-the-art technologies, High Power Impulse Magnetron Sputtering produces very dense and droplet free coatings due to the high plasma density and ionisation rate. However, thorough investigation of the coating morphology by Scanning Electron Microscopy, optical microscopy and other surface analysis methods revealed the existence of various types of coating defects. This study reports the influence of chamber pressure in particular on defect formation in CrN/NbN nanoscale multilayer coatings. The coating series was deposited using combined HIPIMS/UBM technique while varying the total chamber pressure from 0.2 Pa to 1 Pa. Four types of defects were identified, namely, nodular, open void, cone-like and pinhole. Defect density calculations showed that the coating produced at the lowest pressure, 0.2 Pa, had the lowest defect density of 0.84%. As expected coating corrosion properties improved linearly with decreasing defect density. Potentiodynamic polarisation corrosion studies revealed that in the anodic potential range of - 300 mV to + 300 mV, the current density decreased with decreasing defect density (from 5.96% to 0.84%). In contrast, pin-on-disk tribology tests at room temperature demonstrated that the tribological properties of the coatings deposited at different chamber pressures were dependent on their bilayer thickness and on the nature of the oxides formed at the tribological contact. The coating with highest bilayer thickness had the lowest wear rate (1.6×10~(-15) m~3N~(-1)m~(-1)). In contrast, the friction properties of the coating were influenced by tribolayer formation during the tribological tests.
机译:据报道,与最先进的技术相比,大功率脉冲磁控溅射由于具有较高的等离子体密度和电离速率,因此可产生非常致密且无液滴的涂层。然而,通过扫描电子显微镜,光学显微镜和其他表面分析方法对涂层形态的透彻研究表明存在各种类型的涂层缺陷。这项研究报告了腔室压力尤其是对CrN / NbN纳米多层涂层中缺陷形成的影响。使用HIPIMS / UBM组合技术沉积涂层系列,同时将总腔室压力从0.2 Pa更改为1 Pa。确定了四种类型的缺陷,即结节状,开孔状,圆锥状和针孔状。缺陷密度计算表明,在最低压力0.2 Pa下生产的涂层具有0.84%的最低缺陷密度。如所期望的,涂层腐蚀性能随着缺陷密度的降低而线性改善。电位动力极化腐蚀研究表明,在-300 mV至+ 300 mV的阳极电位范围内,电流密度随着缺陷密度的降低而降低(从5.96%降至0.84%)。相反,在室温下针对磁盘的摩擦学测试表明,在不同的腔室压力下沉积的涂层的摩擦学性能取决于其双层厚度以及在摩擦学接触时形成的氧化物的性质。双层厚度最大的涂层磨损率最低(1.6×10〜(-15)m〜3N〜(-1)m〜(-1))。相反,在摩擦学测试中,涂层的摩擦性能受摩擦层形成的影响。

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