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Quasi in-situ study of morphological evolution of the interfacial IMC in single-sided interface Sn-0.3Ag-0.7Cu/Cu joints during multiple reflow process

机译:单侧界面Sn-0.3Ag-0.7Cu / Cu接头多次回流过程中界面IMC形态演化的拟原位研究

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In electronic packaging, the interfacial IMC of solder interconnects (or joints) has long been recognized as an important factor influencing the reliability of solder joints. In this study, a novel quasi in-situ method is proposed to achieve the continual observation of morphological evolution and growth of the interfacial IMC grains in single-sided interface Sn-0.3Ag-0.7Cu/Cu joints undergoing multiple reflow soldering process. Results show that the scallop-like CuSn grains exhibits a surface morphology change from the protruding to flat against the number of reflow cycles, and the interfacial IMC grains grow significantly as the reflowing time is prolonged or the reflow temperature is increased. The growth of interfacial CuSn grains in SAC0307/Cu joints shows the characteristics described by the theory of Ostwald ripening, in which some large grains grow rapidly while some small grains neighboring the growing large grains disappear. The interfacial IMC grains with the ripening growth behavior locate mainly near the Cu substrate, and the ripening behavior of IMC grains is always accompanied with the interfacial reaction growth behavior throughout the entire reflow process.
机译:在电子封装中,焊料互连(或接头)的界面IMC长期以来被认为是影响焊料接头可靠性的重要因素。在这项研究中,提出了一种新的准原位方法,以实现对经过多次回流焊接的单面界面Sn-0.3Ag-0.7Cu / Cu接头中IMC晶粒的形态演变和生长的连续观察。结果表明,扇贝形的CuSn晶粒随着回流次数的增加而呈现出从凸起到平坦的表面形态变化,随着回流时间的延长或回流温度的升高,界面IMC晶粒显着增长。 SAC0307 / Cu接头中的界面CuSn晶粒的生长表现出了奥斯特瓦尔德(Ostwald)成熟理论所描述的特征,其中一些大晶粒快速生长,而一些与生长大晶粒相邻的小晶粒消失了。具有成熟生长行为的界面IMC晶粒主要位于Cu基底附近,并且在整个回流过程中,IMC晶粒的成熟行为始终伴随着界面反应的生长行为。

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