HIGH HAZE TEXTURED SURFACE B-DOPED ZNO-TCO FILMS ON CHEMICALLY ETCHED GLASS SUBSTRATES FOR SI-BASED THIN FILM SOLAR CELLS

摘要

Textured glass substrates with crater-like feature sizes of ～5-30 μm were obtained using chemical etching method. Pyramid-like boron-doped zinc oxide (ZnO:B) films with feature sizes of ～300-800 nm were deposited on the etched glass substrates by the metal organic chemical deposition (MOCVD) technique using water (H_2O) as an oxidant for diethylzinc (DEZn) and 1%-hydrogen-diluted diborane (B_2H_6) as a dopant gas. The ZnO:B films on the etched glass (i.e. etched glass/ZnO:B) with microano double textures presented much stronger light-scattering capability than the conventional ZnO:B on the flat glass (i.e. flat glass/ZnO:B) and their electrical properties changed little. Typical etched glass-3R/ZnO:B exhibited a high root mean square (RMS) roughness of ～160 nm. The haze values at the wavelength of 550 nm and 850 nm for etched glass-3R/ZnO:B sample were 61% and 42%, respectively. The high haze etched glass/ZnO:B substrates have potential merits for thin film solar cells.