首页> 外文会议>Annual NSTI nanotechnology conference and expo;TechConnect world innovation conference expo >Drain Current Model for Thin Body Undoped and Lightly Doped Double-Gate MOSFETs
【24h】

Drain Current Model for Thin Body Undoped and Lightly Doped Double-Gate MOSFETs

机译:薄体无掺杂和轻掺杂双栅MOSFET的漏极电流模型

获取原文

摘要

In this work, we incorporate quantum physics to develop analytical models for doped and undoped, thin-body DG FETs. An explicit current model has been introduced in terms of both source and drain charge densities at which hole and electron quasi-Fermi level or IMREFs are defined. Our compact models, with no fitting parameters, give good predictions of the quantum volume inversion charge and drain current. These models have been verified with self-consistent results form numerical calculations of the coupled Poission-Schrodinger equations. An important consequence of new compact models can be inserted into simulation programs such as SPICE, thus overcoming limitations when only classical physics is used.
机译:在这项工作中,我们结合了量子物理学,以开发用于掺杂和未掺杂的薄型DG FET的分析模型。根据源和漏电荷密度引入了一个明确的电流模型,在该模型中定义了空穴和电子准费米能级或IMREF。我们的紧凑型模型没有拟合参数,可以很好地预测量子体积反转的电荷和漏极电流。这些模型已经通过耦合Poission-Schrodinger方程的数值计算的自洽结果得到了验证。可以将新的紧凑模型的重要结果插入诸如SPICE之类的仿真程序中,从而克服了仅使用经典物理学时的局限性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号