450mm metrology and inspection: The current state and the road ahead

摘要

450mm metrology is off to a great start. Early test wafer tools have provided all the basic characterization techniques needed for ETW pilot line demonstration, but, recent changes to 450mm HVM insertion strategy have presented new challenges. This paper provides an update to the current state of 450mm metrology, highlights some of the challenges the 450mm transition has presented, discusses some proposed new or modified standards for 450mm, and outlines future work planned by G450C and its collaboration partners.