A Holistic Approach Toward UHP Gas Delivery System Design Reduces Stochastic Variability Of Reactant Distribution In Plasma Etch And Deposition Equipment : EO: Equipment Optimization

摘要

Pulsed nanoscale dry processes rely on stable and repeatable reactant delivery, among other important process considerations. Gas delivery systems designed for continuous etch, and for continuous deposition, may not be up to the challenge of pulsed nanoscale processing as a result of the overall gas delivery system design, or as a result of mass flow controller performance. MFC transients are a source of stochastic process variability, particularly in short Atomic Layer Etch cycles. We performed evaluations of various MFC technologies using SEMI standard procedures, and present results here from the data we collected.