Texturing of multi-crystalline silicon wafer by ultrasonic standing wave

摘要

Nowadays solar energy receives more and more attention for its clear,non-pollutant and renewable characteristics.Although the production cost of electricity by solar cell is much higher than those by fossil fuels currently,solar cell has partly substituted traditional energy and be used in somefields.Silicon wafer surface texture act an important role in solar cell,which can trap the incident lights and influence the photoelectric conversion.In this paper,a new method using ultrasonic standing wave is present based on the previous researches.The acid molecules are droved to distribute regularly in terms of the standing wave.Then regular morphology can be textured on the surface of mc-Si by the acid molecules etching with silicon.SEM experiment illustrate the present method can texture regular morphology on the surface of multi-crystalline silicon (mc-Si),also the antireflection of 9.4％ is much lower than that of traditional acid etching.