The Novel TEOS-O_3 CVD USG Process by Chamber Surface Characterization

摘要

This work presents a novel sub-atmospheric CVD (SACVD) undoped silicon glass (USG) process by suing TEOS-O_3 films to do chamber seasoning instead of conventional PETEOS films. PETEOS oxide seasoned on the showerhead will induce surface sensitivity effect for the subsequent SA-USG films deposition and caused lower deposition rate, faster wet-etching rate. Our results indicated tht non-surface-sensitive oxide, such as low-pressure TEOS-O_3 film, could be used to replace PETEOS oxide seasoning, by using this process, superior film quality, higher deposition rates and throughput, better particle performance could be obtained for the following SAUSG film deposition.