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A VLSI artwork legalization technique based on a new criterion of minimum layout perturbation

机译：基于最小布局扰动新准则的VLSI艺术品合法化技术

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来源
《International symposium on Physical design》|1997年|P.116-121|共6页
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作者
Fook-Luen Heng; Zhan Chen; Gustavo E. Tellez;
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正文语种
中图分类半导体技术;
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8. Prolog for VLSI Layout: Experiences in the Design and Implementation of Topolog, A Prolog Based Module Generation and Layout System [R] . McGeer, P. C., Bush, W. R., Cheng, G., 1987

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