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Laser-induced processes on the back side of dielectric surfaces using a CuSO_4-based absorber liquid

机译:使用基于CuSO_4的吸收剂液体在电介质表面的背面进行激光诱导的过程

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Micro-structured dielectric surfaces in combination with electrode structures are promising in the field of rapid prototyping of micro-sensors. In this work laser-induced back side etching and back side deposition using aqueous copper sulfate in form of a tartrate complex with formaldehyde as absorber liquid has been investigated regarding this aim. Results obtained with different laser systems ranging from UV to Near-IR and with pulse lengths from femtoseconds to nanoseconds will be presented, in order to give a wide-spread overview of the different observable effects. Depending on the specific setup and laser parameters, either well-defined compact Cu deposits, micro- or nano-scaled Cu droplets or ablation of the dielectric substrate was observed. Best quality crystalline and conducting Cu structures were achieved using ns pulses at 532 run wavelength. Droplet formation with UV excimer laser was observed. Parameters influencing each configuration will be discussed.
机译:与电极结构结合的微结构介电表面在微传感器快速原型化领域中很有希望。在该工作中,针对该目的,已经研究了使用酒石酸氢盐配合物形式的硫酸铜水溶液和甲醛作为吸收剂液体的激光诱导的背面蚀刻和背面沉积。将介绍使用从紫外到近红外的不同激光系统以及从飞秒到纳秒的脉冲长度获得的结果,以便广泛地概述不同的可观察效果。根据特定的设置和激光参数,可以观察到明确定义的紧凑型铜沉积物,微米级或纳米级的铜滴或电介质基板的烧蚀。使用532游程波长的ns脉冲可获得最佳质量的晶体和导电Cu结构。用紫外线准分子激光器观察到液滴的形成。将讨论影响每种配置的参数。

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