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Photoluminescence from deep levels in Fe-doped InP substrates

机译:掺杂铁的InP衬底中深层的光致发光

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摘要

Photoluminescence (PL) measurements have been carried out at room temperature in commercially-available 4-inch-diameter Fe-doped semi-insulating InP substrates with a high-sensitivity PL mapping system using photon-counting technique. Not only a sharp PL line due to band-to-band transition but a broad PL line due to recombination via deep levels are successfully detected at room temperature. It is found from a comparison between band-to-band and deep-level PL maps measured near striation pattern that there is a correlation between their PL intensities.
机译:已经在室温下在商业上可买到的4英寸直径掺铁半绝缘InP衬底中进行了光致发光(PL)测量,该衬底使用高灵敏度PL映射系统,采用了光子计数技术。在室温下,不仅能成功检测到由于带间跃迁而产生的锋利的PL线,而且由于通过深层次的重组而导致的宽泛的PL线也能成功检测到。通过比较在条纹图案附近测得的频带间和深层PL图,可以发现它们的PL强度之间存在相关性。

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