INTERMIXING OF ATOMS ACROSS HETEROINTERFACES IN THIN FILM PHOTOVOLTAIC MATERIALS: NONDESTRUCTIVE X-RAY CHARACTERIZATION USING SYNCHROTRON RADIATION

摘要

X-rays from synchrotron radiation provide many useful techniques for the study of interface morphology in layer-structured materials. These methods can be conveniently employed for characterizing the interfacial roughness and intermixing of constituent atoms across the heterointerface in thin film photovoltaic materials. A brief review of the working principle of these techniques and some recent results are presented.