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Point defects in dilute nitride III-N-As and III-N-P

机译:稀氮化物III-N-As和III-N-P中的点缺陷

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摘要

We provide a brief review of our recent results from optically detected magnetic resonance studies of grown-in non-radiative defects in two most important dilute nitride systems-Ga(In)NAs grown on GaAs substrates and Ga(Al,In)NP grown on Si and GaP substrates. These results have led to the identification of defect complexes in the alloys, involving intrinsic defects such as As_(Ga) antisites and Ga_i self-interstitials. They have also shed light on formation mechanisms of the defects and on their role in non-radiative carrier recombination that is harmful to the performance of potential optoelectronic and photonic devices based on these dilute nitrides.
机译:我们简要回顾了我们最近的结果,这些结果来自光学检测磁共振研究,该研究研究了两种最重要的稀氮化物系统-生长在GaAs衬底上的Ga(In)NA和生长在GaAs上的Ga(Al,In)NP的非辐射缺陷。 Si和GaP衬底。这些结果导致鉴定了合金中的缺陷络合物,涉及固有缺陷,例如As_(Ga)反位点和Ga_i自填隙。他们还阐明了缺陷的形成机理,以及它们在非辐射载流子复合中的作用,这种复合物对基于这些稀氮化物的潜在光电和光子器件的性能有害。

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